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Development 3d Dimensional 'aD Tool (CHA')

nano (xi'an) Metrology co., Ltd | Updated: Oct 24, 2016
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b. nejwI' pat developemnt

qaStaHvIS'aD HablI' (cmm Quv), implement 'ay' 'oH laH Hoch wo' measurement nejwI' tlhoj, 'aD accuracy, qechmeyDaj Huj yo'SeH waH efficiency 'ej automation Hoch wo' moH 'oH. vaj latlh HoS jen yIqaw nejwI' 'aD HaD 'arghbej Quv HablI' manufacturers 'ej researchers.nejwI'luDalaH Segh, tlham, principle, legh je noch yIqaw, vaj Sa' 'aD nach complicated mamej latlh.

in terms of nejwI' HaD:

(1) Qul 'ej nap tlham, chu' Segh Hach.jen precision three-dimensional measurementnejwI', especially yuQmeyDaq micro vum-'ay' 'ej yuQmeyDaq jen speed, nejwI' 'aD 'aD.

(2) nejwI' accessories Hach, HablI' Quv QaptaHvIS Sach.

(3) QI'yaH-contact 'aD nejwI' Hach 'ej measurement accuracy Dub 'ej range scope 'ej Sach.

'utmo' Dujvam c. Disadvantages cmm je

tera'Daq veQ 'utmo' Dujvam DaH nobvam chaq wej Quv 'aD HablI' law' modern yIteb precise 'ej comprehensive 'aD jan:

(1) Sar 'ay' three-dimensional contour size position 'ej parameters laH Hergh 'aD HoS flexibility laH measurement lang spatial Quv tlhoj, baS;

(2) jen precision measurement 'ej reliability.

(3) laH digital arithmetic ghun 'ej SeH tlhoj Hergh 'ej ghaj jen val qechmeyDaj Huj.

'ach lumaq lach'eghDI' shortcomings je ghaj wej Quv 'aD HablI'. wa'DIch 'oH wagh, veb requirements 'orwI'.


DubelmoHchugh maHvaD yu' 'ej QuQ vIvoqHa' pagh qeS inform

email:overseas@cmm-nano.com


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